Astrileux Corporation
Tunable multispectral EUV reflective coatings for extreme ultraviolet telescopes
- Sector
- Aerospace
- Headquarters
- Carlsbad, CA
- Total capital
- $2.2M
- Federal grants
- $2.2M
- 5 awards · 2015–2025
- Rank in peer group#59 of 61
- Private capital raised
- None on recordNo Form D filings on SEC EDGAR. Some raises are not filed.
- Federal contracts
- None on recordNo federal contract awards found.
- Granted patents
- 0
- 5 pending
Capital timeline
Latest events
- Federal grantNASA · Phase I · Bir I The Blueprint For Generative AI Chips Manufactured On The Iss$150K
- Federal grantNASA · Phase I · A New Platform of Tunable Multispectral EUV Coatings$125K
- Federal grantNSF · Phase II · SBIR Phase II: Next Generation High Performance EUV Photomasks.$950K
- Federal grantNSF · Phase I · SBIR Phase I: High Fidelity EUV PhotoMasks$225K
- Federal grantNSF · Phase II · SBIR Phase II: Novel Technologies to Enable High Volume, Extreme Ultraviolet Manufacturing of Integrated Circuits$742K
Node area is scaled to amount. Form D reports securities sold, which can differ from an announced round; filings are numbered in the order they were made.
Standing among 61 peers
Line = medianAerospace · Material
- Federal grantsBelow median
- Linked publications#9 · top 15%
Cumulative measures favor older companies. Rankings describe position today, not outcome. Below the median, ranks show as a band rather than a number.
Founders and team
No founders are linked to this company yet.
Founders appear once a person is matched to the company through its own patents, grants or filings. We never infer people from social profiles.
Checked: USPTO inventors; federal award principal investigators; SEC Form D related persons · Oct 23, 2026
Claim this profile to add your teamWhat it has protected
USPTO · 0 granted of 5- PendingEuv Photomask Architectures For Patterning Of Integrated CircuitsUSPTOApplication 17956042
- PendingPhotomask Having Reflective Layer With Non-reflective RegionsUSPTOApplication 16656489
- PendingEuv Photomask Architectures For Patterning Of Integrated CircuitsUSPTOApplication 63250032
Show all 5 patent records
- Euv Photomask Architectures For Patterning Of Integrated CircuitsMar 30, 2023 · Application 17956042Pending
- Photomask Having Reflective Layer With Non-reflective RegionsApr 23, 2020 · Application 16656489Pending
- Euv Photomask Architectures For Patterning Of Integrated CircuitsApplication 63250032Pending
- Photomask Having Reflective Layer With Non-reflective RegionsApplication PCTUS2019056778Pending
- Photomask Having Reflective Layer With Non-reflective RegionsApplication 62746702Pending
Recent research by its founders
- New materials and their architectures for EUV photomasks20230 cites
- Enhancing lithographic performance by new EUV photomask materials20210 cites
- New idealized designs for the EUV photomask20210 cites
Related companies, and why
- WyvernSimilar federal contract value in Aerospace · $500 in contracts
- ONYX AEROSPACE INCSimilar federal contract value in Aerospace · $500 in contracts
- REDTOWER ENTERPRISES LLCSimilar federal contract value in Aerospace · null in contracts
- FRINGE METROLOGY LLCSimilar federal contract value in Aerospace · null in contracts
- NOVI LLCSimilar federal contract value in Aerospace · null in contracts
- eSat Global IncSimilar federal contract value in Aerospace · null in contracts
Regulatory activity · Aerospace
- Nondiscrimination in Federally Assisted Programs of NASA-Effectuation of Title VI of the Civil Rights Act of 1964National Aeronautics and Space Administration
- Special Conditions: AMAC Aerospace, The Boeing Company Model 747- 8 Airplane; Side-Facing SeatsFederal Aviation Administration
- Standard Instrument Approach Procedures, and Takeoff Minimums and Obstacle Departure Procedures; Miscellaneous AmendmentsFederal Aviation Administration
- Operating Limitations at John F. Kennedy International AirportFederal Aviation Administration
- Operating Limitations at New York LaGuardia AirportFederal Aviation Administration
- Special Conditions: Honeywell Aerospace US LLC, Dassault Aviation Model Falcon 900EX Airplane; Electronic System Security Protection From Unauthorized External AccessFederal Aviation Administration
Rules are matched to sector, not to company. Recent activity in a sector is context rather than a signal about this business — until rules are matched to what a company actually builds, the section is shown as context and nothing more.
Sources
Federal grants from SBIR/STTR, NIH, NSF and DoD records. Federal contracts from USAspending.gov. Private capital from SEC Form D. Patents from USPTO. Publications from OpenAlex. Regulatory activity from the Federal Register. Press matched on company name.
How to read this page
Figures show associations in public records, not causes or predictions. Nothing here is investment advice. An em-dash means no record was found under this company's name, not that none exists.
Data freshness
SEC Form D filings through . SBIR and STTR awards through .